ANALYSIS OF DEPOSITION METHODS FOR ZnO BASED AMORPHOUS FUNCTIONAL LAYERS FOR TRANSPARENT ELECTRONICS DEVICES
The processes of growth of nanocrystalline and amorphous ZnO-based thin films by magnetron sputtering method are analyzed. The effect of doping components and the level of doping on the degree of film amorphization has been studied. The effect of hydrogen in the composition of the atmosphere on the structural perfection of the deposited ZnO-based thin films is considered. The dependence of the structure of ZnO–SnO2 thin films on the component ratio in sputtered targets is shown. The mechanisms of of ZnO-based amorphous formation films by magnetron sputtering methods are discussed.
Tags: amorphization deposition doping magnetron sputtering thin film zno аморфизация магнетронное распыление напыление примесь тонкая пленка
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