rus
Competent opinion
Test & Measurement
G.Meshkov, A.Sagitova, O.Sinitsyna, I.Yaminsky
Methods of scanning probe microscopy in development of energy efficient technologies On the basis of a combination of atomic force microscopy with new and improved methods of piezoelectrochemical, electrochemical and ion conductance microscopy an experimental system was developed to investigate the morphology and properties of the materials used for the accumulation and conversion of energy and catalysis.
Methods of scanning probe microscopy in development of energy efficient technologies On the basis of a combination of atomic force microscopy with new and improved methods of piezoelectrochemical, electrochemical and ion conductance microscopy an experimental system was developed to investigate the morphology and properties of the materials used for the accumulation and conversion of energy and catalysis.
Tags: ion conductance microscopy nanolithography scanning probe microscopy ион-проводящая микроскопия нанолитография сканирующая зондовая микроскопия
O.Sinitsyna, G.Meshkov, I.Yaminsky
Study of stages of electrochemical synthesis of graphite oxide using multifunctional scanning probe microscopy With the use of scanning probe microscopy the oxidation of graphite by electric current in the absence of intercalating agent is investigated. The obtained results can be used to create catalysts and sensory elements and are of considerable interest for further development of scanning probe lithography of carbon materials.
Study of stages of electrochemical synthesis of graphite oxide using multifunctional scanning probe microscopy With the use of scanning probe microscopy the oxidation of graphite by electric current in the absence of intercalating agent is investigated. The obtained results can be used to create catalysts and sensory elements and are of considerable interest for further development of scanning probe lithography of carbon materials.
Tags: graphite oxide nanolithography scanning probe microscopy нанолитография оксид графита сканирующая зондовая микроскопия
A.Potemkin
Ensuring of metrological responsibility of displacement measurements in nanometer range The metrological measuring set with the dynamic gauge is a technically complex and knowledge-intensive product, which is many times superior to metrological devices based on piezoceramics. Dynamic gauges provide the advanced development of metrology in comparison
with the nanotechnology.
Ensuring of metrological responsibility of displacement measurements in nanometer range The metrological measuring set with the dynamic gauge is a technically complex and knowledge-intensive product, which is many times superior to metrological devices based on piezoceramics. Dynamic gauges provide the advanced development of metrology in comparison
with the nanotechnology.
Tags: dynamic gauge metrology nanoindustry nanometer range динамическая мера метрология нанодиапазон наноиндустрия
V.Mesheryakov, I.Maslenikov, V.Reshetov, A.Useinov
Use of indenter resonant oscillation frequency to improve indentation load resolution A method of measuring the average force of interaction of the oscillating indenter tip with the sample based on the data about the shift of the resonance frequency of the oscillations in contact with the surface is proposed.
Use of indenter resonant oscillation frequency to improve indentation load resolution A method of measuring the average force of interaction of the oscillating indenter tip with the sample based on the data about the shift of the resonance frequency of the oscillations in contact with the surface is proposed.
Tags: elastic modulus hardness instrumental indentation инструментальное индентирование модуль упругости твердость
Military nanotechnology
Ju.Altmann
Military applications of nanotechnology: nuclear weapon Such issues are discussed as the use of nanotechnology for control, storage, security and readiness of nuclear weapon.
Military applications of nanotechnology: nuclear weapon Such issues are discussed as the use of nanotechnology for control, storage, security and readiness of nuclear weapon.
Education
A.Ahmetova, Yu.Belov, I.Yaminsky
Modular multiaxis machining center for nanoindustry New modular machining center is developed for a wide range of applications in industry and education.
Modular multiaxis machining center for nanoindustry New modular machining center is developed for a wide range of applications in industry and education.
Nanotechnology
A.Benediktov, E.Gornev, P.Ignatov
Constructive and technological solutions for silicon element base of high-temperature microelectronics The main design and technological solutions for development of components of high-temperature microelectronics based on silicon structures are considered. The possibility and prospects of CMOS technology on the basis of silicon on insulator (SOI) structures is shown.
Constructive and technological solutions for silicon element base of high-temperature microelectronics The main design and technological solutions for development of components of high-temperature microelectronics based on silicon structures are considered. The possibility and prospects of CMOS technology on the basis of silicon on insulator (SOI) structures is shown.
A.Soloviev, A.Bondar, S.Snytin, O.Yuferov
Import-substituting high-tech production of medical devices Bochvar VNIINM and TREK-E Komposit started the creation of import-substituting high-tech serial production of prostheses of large joints and of other medical devices for orthopedics and traumatology.
Import-substituting high-tech production of medical devices Bochvar VNIINM and TREK-E Komposit started the creation of import-substituting high-tech serial production of prostheses of large joints and of other medical devices for orthopedics and traumatology.
E.Bernard-Moulin, A.Uvarov, H.Desré
Hard materials deep etch This paper highlights possible applications of hard materials in semiconductor industry, and appropriate equipment and etch processes for hard material treatment by plasma.
Hard materials deep etch This paper highlights possible applications of hard materials in semiconductor industry, and appropriate equipment and etch processes for hard material treatment by plasma.