The paper analyzes the current state of the chemical vapor deposition (CVD). The basic problem of the technology is described and the fundamental reason for its existence is analyzed. The paper demonstrates a constant deficit of the experimental data on the results of CVD, as well as inadequate approaches to experimental research. All of this leads to the poor solution of the optimization problem of thin film deposition with desired physical and chemical parameters. We are firstly proposing to use a microreactor CVD. The definition of microreactor CVD is formulated in this paper, and the basic properties of the technology are described.


Разработка: студия Green Art