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Maskless laser lithography makes it possible to simplify the production of semiconductor devices due to the exclusion from the workflow of operations related to the manufacture, use and storage of photomasks.
Maskless laser lithography makes it possible to simplify the production of semiconductor devices due to the exclusion from the workflow of operations related to the manufacture, use and storage of photomasks. The technological leader in the development and production of laser equipment for direct exposures and lithography for more than a quarter of a century is the Heidelberg Instruments. At the SEMICON Europa 2017, the German company announced a new MLA300 system, which has a throughput of up to 60 wafers per hour. Dr. Sven Preuss, Sales Director Europe, told us about this and other developments of Heidelberg Instruments.
Mr. Prouss, what are the areas of development of laser systems for direct exposures and lithography?
Areas of development are determined by increasing user requirements for the throughput and accuracy of laser exposure systems. One of our answers to these challenges is the MLA300 laser system for maskless lithography, which is planned to be launched on the market in 2018. This is an automatic equipment designed for substrates up to 300Ч300 mm. Maximum throughput of MLA300 reaches 60 wafers per hour, which is an absolute record for equipment of this class. Our developments in the field of resolution enhancement were embodied in the advanced DWL 66+ system introduced in 2017, which now has a 300 nm resolution mode.
Is it possible to further increase the resolution and speed of exposure?
The critical parameter for the exposure rate is the laser power. As laser technology is constantly improving, it can be predicted that the throughput of laser exposure systems will increase. The resolution is limited by the laws of physics, so one should hardly expect a significant improvement in this parameter.
The development of electron-beam lithography can be a challenge for manufacturers of laser systems?
Electron beam lithography is intended for another market segment. Its use is advisable if it is required to obtain structures with a topology size of tens of nanometers, and the speed of exposure is not important. We offer equipment that has a lower resolution than electron beam systems, but much higher throughput, and can be used not only in research and development, but also in mass production of semiconductor devices.
How do you estimate the volume of the market for laser exposure systems?
With the development of the MLA series, the potential market has significantly increased, since there is a real prospect of a gradual replacement of traditional lithographic systems with our equipment. Previously, customers bought one system for mask making to several units of traditional lithographic equipment, but now the trend is gradually phasing out obsolete photolithography systems in favor of our solutions for direct writing.
What are the advantages of Heidelberg Instruments' equipment in comparison with analogues?
Our company is distinguished from competitors, firstly, by 30 years of experience in the market of laser exposure systems, and secondly, by the fact that we ourselves develop all the main components, including optics and electronics, as well as software, and can offer to our customers really unique solutions. As a result, more than 800 units of our equipment are installed in more than 50 countries of the world, and such developments as the MLA300 and the new DWL 66+ are virtually unmatched.
What is the sales structure of Heidelberg Instruments' equipment?
Approximately two thirds of our sales come from scientific and educational institutions and one third from industry. But industrial enterprises often use our equipment for research and development, as well as for the manufacture of experimental series of products. The launch of the MLA300 system will certainly strengthen our position in the industrial segment.
How do you assess the position of Heidelberg Instruments on the Russian market?
Russia is a fairly dynamic market, where our solutions are in a strong demand. Currently, about 50 laser exposure systems have been installed, and we highly appreciate the results of cooperation with our Russian partner, MINATEH.
Interview: Dmitry Gudilin
Mr. Prouss, what are the areas of development of laser systems for direct exposures and lithography?
Areas of development are determined by increasing user requirements for the throughput and accuracy of laser exposure systems. One of our answers to these challenges is the MLA300 laser system for maskless lithography, which is planned to be launched on the market in 2018. This is an automatic equipment designed for substrates up to 300Ч300 mm. Maximum throughput of MLA300 reaches 60 wafers per hour, which is an absolute record for equipment of this class. Our developments in the field of resolution enhancement were embodied in the advanced DWL 66+ system introduced in 2017, which now has a 300 nm resolution mode.
Is it possible to further increase the resolution and speed of exposure?
The critical parameter for the exposure rate is the laser power. As laser technology is constantly improving, it can be predicted that the throughput of laser exposure systems will increase. The resolution is limited by the laws of physics, so one should hardly expect a significant improvement in this parameter.
The development of electron-beam lithography can be a challenge for manufacturers of laser systems?
Electron beam lithography is intended for another market segment. Its use is advisable if it is required to obtain structures with a topology size of tens of nanometers, and the speed of exposure is not important. We offer equipment that has a lower resolution than electron beam systems, but much higher throughput, and can be used not only in research and development, but also in mass production of semiconductor devices.
How do you estimate the volume of the market for laser exposure systems?
With the development of the MLA series, the potential market has significantly increased, since there is a real prospect of a gradual replacement of traditional lithographic systems with our equipment. Previously, customers bought one system for mask making to several units of traditional lithographic equipment, but now the trend is gradually phasing out obsolete photolithography systems in favor of our solutions for direct writing.
What are the advantages of Heidelberg Instruments' equipment in comparison with analogues?
Our company is distinguished from competitors, firstly, by 30 years of experience in the market of laser exposure systems, and secondly, by the fact that we ourselves develop all the main components, including optics and electronics, as well as software, and can offer to our customers really unique solutions. As a result, more than 800 units of our equipment are installed in more than 50 countries of the world, and such developments as the MLA300 and the new DWL 66+ are virtually unmatched.
What is the sales structure of Heidelberg Instruments' equipment?
Approximately two thirds of our sales come from scientific and educational institutions and one third from industry. But industrial enterprises often use our equipment for research and development, as well as for the manufacture of experimental series of products. The launch of the MLA300 system will certainly strengthen our position in the industrial segment.
How do you assess the position of Heidelberg Instruments on the Russian market?
Russia is a fairly dynamic market, where our solutions are in a strong demand. Currently, about 50 laser exposure systems have been installed, and we highly appreciate the results of cooperation with our Russian partner, MINATEH.
Interview: Dmitry Gudilin
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