DOI: 10.22184/1993-8578.2022.15.3-4.224.231

Main sources of micro-contamination of the micro- and nanoelectronic devices in vacuum cluster-type processing equipment were analysed. Generation mechanism of microparticles flows at locks and processing vacuum chambers, molecular contamination and metal particles as a results of construction materials wear and tribo-desorption were shown.


Разработка: студия Green Art