The experience of the development of X-ray measurement systems based on dual-wavelength scheme for the analysis of solid-state micro- and nanostructures is summarized. Particular attention is paid to the use of the X-ray systems for the investigation of multilayer thin-film structures of nanoelectronics, as well as a description of the prospects for the use of a new generation of portable microfocus X-ray sources with diamond anode substrate


Разработка: студия Green Art