rus
The French company IBS (Ion Beam Services) for more than 20 years specializes in the processes and equipment for ion implantation for doping semiconductor wafers and epitaxial structures. The headquarter of the company, which was founded in 1987, is located in Peynier, near Marseille. In Russia Technoinfo Ltd. is the official representative of the IBS. In 2003, IBS started to produce implantation systems of IMC series, and in 2007 developed PULSION plasma immersion ion implantation system. Thus, IBS has its own process equipment and offers ion implantation as outsourcing service. Gilles Mathieu, COO at IBS, told about the equipment of the company.
Mr. Mathieu, what are target segments for your ion implantation systems?
We focus primarily on niche markets, such as research, development and manufacture of semiconductor devices on silicon carbide. The main customers are research centers, as well as a small production companies that use wafers with a diameter of 100, 125 or 150 mm. Our IMC200 ion implantation systems are optimally suited for tasks of such organizations. Currently two models are available in this series, highly automated IMC-200P is designed for small and medium production, and IMC-200RD with advanced setting features, which is optimal for research and development. The IHC-160P model is developed for medium to large series.
The PULSION plasma immersion ion implantation system is based on the polarization technology with the use of pulsed plasma source. It is characterized by very low energy up to 20 eV, and provides exceptional stability with ability of precise control of the doping depth. This series also includes two models, high-performance Pulsion HP for 200 mm and 300 mm wafers, and Pulsion Nano, focused on the development of semiconductor nanodevices. Plasma immersion ion implantation is optimal for doping of the polysilicon, for 3D applications, production of solar cells, modification of materials.
How would you describe the main features of the IBS equipment??
Low consumption of materials, energy efficiency, small footprint, compatibility with plates of small diameter, relatively low price.
How have customer requirements changed?
Firstly, manufacturers of semiconductor devices must to operate with components whose size is getting smaller. Industrial technologies in electronics has reached the 10 nm node, which is a challenge for producers of ion implantation systems. Secondly, a number of semiconductor materials tends to grow. Germanium, quartz, gallium nitride, gallium arsenide, lithium niobate… the variety of the non-silicon materials is becoming wider. We consider both of these trends. So, if maximum accuracy is required, then our plasma immersion ion implantation system is perfect solution, and for a wide range of different substrates the IMC-200 series is recommended.
How large should be the production volume that it was advantageous to buy their own implantation system instead of outsourcing?
This question has no straightforward answer because it depends on the business model, the need to ensure the security of trade secrets and other factors. Based on the depreciation period, in Europe and North America for equipment of this class about 5 years is necessary. You should take into consideration not only equipment investment but also the costs of staff, materials and electricity and other operating costs. If the company handles annually more than 10 thousand wafers, the purchase of the own implantation system is reasonable. However, for research organization with government funding, it is more important to maintain the secrecy of new developments and know-how.
How in demand is IBS equipment in Russia?
We have customers in Novosibirsk, Zelenograd, Moscow, and negotiate with customers from other cities. In Russia mainly niche semiconductor markets are developed, and this segment is optimally suited for our equipment. Unfortunately, the economic sanctions hamper sales, because some types of ion implantation systems are included in the sanctions lists. I really hope that this unconstructive policy will be changed and we will be able more effectively to cooperate with Russian partners.
Mr. Mathieu, what are target segments for your ion implantation systems?
We focus primarily on niche markets, such as research, development and manufacture of semiconductor devices on silicon carbide. The main customers are research centers, as well as a small production companies that use wafers with a diameter of 100, 125 or 150 mm. Our IMC200 ion implantation systems are optimally suited for tasks of such organizations. Currently two models are available in this series, highly automated IMC-200P is designed for small and medium production, and IMC-200RD with advanced setting features, which is optimal for research and development. The IHC-160P model is developed for medium to large series.
The PULSION plasma immersion ion implantation system is based on the polarization technology with the use of pulsed plasma source. It is characterized by very low energy up to 20 eV, and provides exceptional stability with ability of precise control of the doping depth. This series also includes two models, high-performance Pulsion HP for 200 mm and 300 mm wafers, and Pulsion Nano, focused on the development of semiconductor nanodevices. Plasma immersion ion implantation is optimal for doping of the polysilicon, for 3D applications, production of solar cells, modification of materials.
How would you describe the main features of the IBS equipment??
Low consumption of materials, energy efficiency, small footprint, compatibility with plates of small diameter, relatively low price.
How have customer requirements changed?
Firstly, manufacturers of semiconductor devices must to operate with components whose size is getting smaller. Industrial technologies in electronics has reached the 10 nm node, which is a challenge for producers of ion implantation systems. Secondly, a number of semiconductor materials tends to grow. Germanium, quartz, gallium nitride, gallium arsenide, lithium niobate… the variety of the non-silicon materials is becoming wider. We consider both of these trends. So, if maximum accuracy is required, then our plasma immersion ion implantation system is perfect solution, and for a wide range of different substrates the IMC-200 series is recommended.
How large should be the production volume that it was advantageous to buy their own implantation system instead of outsourcing?
This question has no straightforward answer because it depends on the business model, the need to ensure the security of trade secrets and other factors. Based on the depreciation period, in Europe and North America for equipment of this class about 5 years is necessary. You should take into consideration not only equipment investment but also the costs of staff, materials and electricity and other operating costs. If the company handles annually more than 10 thousand wafers, the purchase of the own implantation system is reasonable. However, for research organization with government funding, it is more important to maintain the secrecy of new developments and know-how.
How in demand is IBS equipment in Russia?
We have customers in Novosibirsk, Zelenograd, Moscow, and negotiate with customers from other cities. In Russia mainly niche semiconductor markets are developed, and this segment is optimally suited for our equipment. Unfortunately, the economic sanctions hamper sales, because some types of ion implantation systems are included in the sanctions lists. I really hope that this unconstructive policy will be changed and we will be able more effectively to cooperate with Russian partners.
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