The simultaneous formation of the functional reliefs on both of the two working surfaces of optical plane-parallel wafers is considered in relation to manufacturing of diffractive and holographic optical elements. The technological possibilities of plasma-chemical etching of glass are investigated for the case of placement the workpiece in the plasma volume and using the diode type device with an outboard planar inductor. It is shown that the quality-limiting factor is the withdrawal of products of chemical reactions from the treated surface.


Разработка: студия Green Art