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Special Issue/2019
N. A. Kuznetsova
Application of new FN-16U photoresist to create semiconductor devices
Application of new FN-16U photoresist to create semiconductor devices
Photoresist FN-16U is a new material for the creation of metal contacts and conductive paths in semiconductor devices by “lift-off” photolithography.
Photoresist FN-16U is a new material for the creation of metal contacts and conductive paths in semiconductor devices by “lift-off” photolithography.
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