started production of elements for lithography equipment A plant for the production of electronic optical elements using MEMS (microelectromechanical systems) technology has been launched at the Moscow Technopolis. The elements are among the most crucial and science-intensive components for maskless lithographs built by the Dutch company, Mapper Lithography. The company, whose shareholders include Rusnano, has invested in setting up the Moscow Technopolis-based facility a total of 1 billion rubles. The new plant in Moscow is built on an area of two thousand square meters, half of which consists of cleanrooms meeting ISO 6 criteria (as verified by measurements). The plant uses the latest high-tech production equipment, including an ASML lithographer, SPTS and Lam Research etching machines, and a Trymax device for photoresist removal. The Moscow plant will employ more than 30 people who have undergone several months of training at the parent company in the Netherlands, including specialists, who have worked for a number of years at leading microelectronics companies in western countries and are now returning to work in Russia.
Mapper Lithography has been developing maskless electron-beam technology for more than 10 years and already has several industrial prototypes of lithographs, which have been purchased and tested by the leading industry players, including the Taiwanese company TSMC and the CEA-Leti Microelectronics Research Institute in France. At its present stage of development Mapper Lithography equipment offers resolution of 22 nanometers. The electronic optics based on microelectromechanical systems (MEMS), which are now being produced in Russia, are the key element of Mapper’s lithography technology. What makes Mapper products revolutionary and sets them apart from competitors is their simultaneous use of 13,000 beams, which dramatically increases system performance compared with use of a single beam. It is intended to produce three types of electronic optics at the Moscow plant. The simplest of them are spacers, which are used to separate electronic optical elements. Next in order of complexity are silicon electronic lenses for focusing and collimation of electron beams. They will come into production by the end of this year. Production of the most complex elements, containing electronics for control electrodes, is scheduled to begin by the end of 2015. Volume of lithography equipment market is about 6 billion dollars, representing sales of several hundred lithograph machines a year. At full capacity Mapper’s Russian plant will produce electronic optic sets for 20 machines per year. Mapper’s lithographs are intended for two types of customers. First, they are well suited to the needs of small and medium-sized chip manufacturers: by dispensing with the need for a mask (one of the most expensive parts of the microelectronics manufacturing process) the new lithographs make cost-effective production of very small batches of chips possible for such manufacturers. Secondly, Mapper lithographs offer major benefits to large companies, which must get new chip-based products to market quickly. Mapper equipment makes it possible to test an almost unlimited number of options at the design stage without creating multiple lithographic masks, substantially reducing the costs and time required to bring the new product to market. The press service of Rusnano
Innovative solution for smart grid
CJSC Profotech and LYSIS LLC, two Russian companies specializing in equipment design for digital substations, presented a unique integrated solution at the CIGRE 2014 international exhibition in France. The solution, intended for construction of 35–1150 kV digital substations, includes optical transformers for current and voltage measurement designed by Profotech, and a hardware-software package by LYSIS, which can be used on universal server platforms and provides all substation protection and management functions. This approach offers savings of up to 60–70% on construction costs and 70% on operating costs for customers. Potential annual savings from use of the solution throughout the Russian electricity grid system are up to 30 billion rubles. The new solution from LYSIS and Profotech, developed entirely by Russian specialists, significantly reduces the amount of measurement and conversion equipment and cables that are needed, reducing the size of premises and achieving maximal levels of standardization and automation. Remote control capabilities make the system easy to use, and there are major gains in the reliability and quality of electricity supply to customers. Digital optical measurement transformers represent an alternative to conventional measurement transformers, offering high accuracy in gauging of current, voltage and phase. The measured quantities are presented via a digital interface for use in secondary equipment (commercial meters, and devices for telemetry, quality control, relay protection and automation). Profotech transformers provide fully digital measurements, reducing error to the greatest extent possible. Integrated into the structure of a substation, the transformers optimize the architecture of power measurement, protection, management and quality control. The iSAS software and equipment complex, developed by LYSIS, provides a full life cycle for substation protection and management systems, including design, testing, commissioning, maintenance and operation. iSAS is an automation system for electricity substations using a technology platform, which unifies all the functions of substation protection, management, measurement and quality control on the basis of software modules. The solution is easily transferable to any Linux hardware platform. Smart grid is a key tool for improving the efficiency of power generation, transmission and distribution. Forecast worldwide public and private investments in smart grid technology up to 2020 are 400 billion dollars, led by China, the United States, Japan, South Korea and Spain. The solution from Profotech and LYSIS offers major savings throughout Russia’s power industry and gives opportunity of competing on domestic and international markets with the most advanced technologies from industry leaders.
The press service of Rusnano
Open Innovations Forum 2014 From 14 to 16 October in Technopolis "Moscow" will be held the Open Innovations Forum 2014 under the auspices of the Government of the Russian Federation with the assistance of the Ministry of Economic Development of the Russian Federation, the Government of Moscow and Russian development institutes: Rusnano, RVC, Skolkovo, Vnesheconombank, the Foundation for Assistance to Small Innovative Enterprises, Agency for Strategic Initiatives on promotion of new projects and the Chamber of Commerce and Industry of the Russian Federation. Key theme of the Forum – "Creative disruption: staying competitive in the XXI century". For three years Open Innovations Forum has acquired the status of global discussion platform dedicated to emerging technologies and furthering innovation prospects and collaboration worldwide. The forum attended by heads of innovative corporations, scientific and educational institutions, government officials and respected experts from many countries of the world. The program will be divided into 16 thematic sections, which will be discussed topical issues of the organization of commercially successful innovation process and the creation of new competitive advantage in a changing market. The partner country of the Open Innovations Forum 2014 is the People's Republic of China. The key novelty – dedicated area, which will showcase 150 technology startups, and a special program for their teams. In the days of the forum in Technopolis "Moscow" will be organized exposition of Science art, all the works presented in Russia for the first time